发明申请
- 专利标题: Multi-stage microporation device
- 专利标题(中): 多级微孔装置
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申请号: US11796107申请日: 2007-04-26
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公开(公告)号: US20080234626A1公开(公告)日: 2008-09-25
- 发明人: Todd M. Chelak
- 申请人: Todd M. Chelak
- 主分类号: A61N1/30
- IPC分类号: A61N1/30
摘要:
A thermal treatment device for forming a micropore in a barrier has a micro-heater component with at least one micro-heater with a thermal member having a base end and a tip end. The device also has an ablation material in the at least one micro-heater and a power supply component for activating the micro-heater component. The ablation material expands in response to the activation in order to mechanically puncture the barrier to a first depth without thermally inducing ablation of the barrier and the micro-heater component enlarges the first depth of the micropore to a second depth and/or produces an improvement in at least one physiological property of the micropore.
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