发明申请
US20080239271A1 ABERRATION MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
有权
ABERRATION测量方法，曝光装置和装置制造方法
- 专利标题： ABERRATION MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： ABERRATION测量方法，曝光装置和装置制造方法
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申请号： US12043578申请日： 2008-03-06
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公开(公告)号： US20080239271A1公开(公告)日： 2008-10-02
- 发明人: Hironori Maeda
- 申请人： Hironori Maeda
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-086469 20070329
- 主分类号： G03B27/54
- IPC分类号： G03B27/54
摘要：
A method for measuring a spherical aberration or a coma aberration of a projection optical system of an exposure apparatus configured to transfer an image of a pattern formed on an original plate onto a substrate through the projection optical system. The method for measuring the spherical aberration includes obtaining a focal position of the projection optical system under a first measurement condition, obtaining a focal position of the projection optical system under a second measurement condition different from the first measurement condition, and measuring the spherical aberration of the projection optical system based on a difference of the focal position obtained under the first and the second measurement conditions.