发明申请
- 专利标题: SYSTEM AND METHOD FOR OPTICAL POWER MANAGEMENT
- 专利标题(中): 光电管理系统与方法
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申请号: US11693277申请日: 2007-03-29
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公开(公告)号: US20080239306A1公开(公告)日: 2008-10-02
- 发明人: William Scott Sutherland , Anis Zribi , Long Que , Glenn Scott Claydon , Stacey Joy Kennerly , Ayan Banerjee , Shivappa Ningappa Goravar , Shankar Chandrasekaran , David Cecil Hays , Victor Samper , Dirk Lange , Marko Baller , Min-Yi Shih , Sandip Maity
- 申请人: William Scott Sutherland , Anis Zribi , Long Que , Glenn Scott Claydon , Stacey Joy Kennerly , Ayan Banerjee , Shivappa Ningappa Goravar , Shankar Chandrasekaran , David Cecil Hays , Victor Samper , Dirk Lange , Marko Baller , Min-Yi Shih , Sandip Maity
- 申请人地址: US NY Schenectady
- 专利权人: GENERAL ELECTRIC COMPANY
- 当前专利权人: GENERAL ELECTRIC COMPANY
- 当前专利权人地址: US NY Schenectady
- 主分类号: G01J3/44
- IPC分类号: G01J3/44 ; G01N21/55 ; G02B26/08
摘要:
A system and method for managing optical power for controlling thermal alteration of a sample undergoing spectroscopic analysis is provided. The system includes a moveable laser beam generator for irradiating the sample and a beam shaping device for moving and shaping the laser beam to prevent thermal overload or build up in the sample. The moveable laser beam generator includes at least one beam shaping device selected from the group consisting of at least one optical lens, at least one optical diffractor, at least one optical path difference modulator, at least one moveable mirror, at least one Micro-Electro-Mechanical Systems (MEMS) integrated circuit (IC), and/or a liquid droplet. The system also includes an at least two degree of freedom (2 DOF) moveable substrate platform and a controller for controlling the laser beam generator and the substrate platform, and for analyzing light reflected from the sample.
公开/授权文献
- US07692785B2 System and method for optical power management 公开/授权日:2010-04-06