发明申请
- 专利标题: At least penta-sided-channel type of finfet transistor
- 专利标题(中): 至少五面通道型finfet晶体管
-
申请号: US12149329申请日: 2008-04-30
-
公开(公告)号: US20080242010A1公开(公告)日: 2008-10-02
- 发明人: Hwa-Sung Rhee , Hyun-Suk Kim , Ueno Tetsuji , Jae-Yoon Yoo , Seung-Hwan Lee , Ho Lee , Moon-han Park
- 申请人: Hwa-Sung Rhee , Hyun-Suk Kim , Ueno Tetsuji , Jae-Yoon Yoo , Seung-Hwan Lee , Ho Lee , Moon-han Park
- 优先权: KR2004-3568 20040117
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
An at least penta-sided-channel type of FinFET transistor may include: a base; a semiconductor body formed on the base, the body being arranged in a long dimension to have source/drain regions sandwiching a channel region, at least the channel, in cross-section transverse to the long dimension, having at least five planar surfaces above the base; a gate insulator on the channel region of the body; and a gate electrode formed on the gate insulator.
公开/授权文献
信息查询
IPC分类: