发明申请
US20080245134A1 METHOD OF MONITORING A SURFACTANT IN A MICROELECTRONIC PROCESS BY ABSORBANCE
有权
通过吸收在微电子过程中监测表面活性剂的方法
- 专利标题： METHOD OF MONITORING A SURFACTANT IN A MICROELECTRONIC PROCESS BY ABSORBANCE
- 专利标题（中）： 通过吸收在微电子过程中监测表面活性剂的方法
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申请号： US11696797申请日： 2007-04-05
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公开(公告)号： US20080245134A1公开(公告)日： 2008-10-09
- 发明人: Amy M. Tseng , John E. Hoots , Brian V. Jenkins
- 申请人： Amy M. Tseng , John E. Hoots , Brian V. Jenkins
- 主分类号： G01N11/00
- IPC分类号： G01N11/00 ; G01N1/00 ; G01N33/00
摘要：
A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the absorbance of a sample collected from a microelectronic process.
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