发明申请
- 专利标题: PROCESS FOR FORMING A CHROMIUM DIFFUSION PORTION AND ARTICLES MADE THEREFROM
- 专利标题(中): 形成铬扩散部分的方法及其制造方法
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申请号: US11696385申请日: 2007-04-04
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公开(公告)号: US20080245445A1公开(公告)日: 2008-10-09
- 发明人: David Andrew Helmick , Dennis William Cavanaugh , Ganjiang Feng , David Vincent Bucci
- 申请人: David Andrew Helmick , Dennis William Cavanaugh , Ganjiang Feng , David Vincent Bucci
- 主分类号: C23C10/26
- IPC分类号: C23C10/26 ; C22C27/06
摘要:
In one embodiment, a method for forming an article with a diffusion portion comprises: forming a slurry comprising chromium and silicon, applying the slurry to the article, and heating the article to a sufficient temperature and for a sufficient period of time to diffuse chromium and silicon into the article and form a diffusion portion comprising silicon and a microstructure comprising α-chromium. In one embodiment, a gas turbine component comprises: a superalloy and a diffusion portion having a depth of less than or equal to 60 μm measured from the superalloy surface into the gas turbine component. The diffusion portion has a diffusion surface having a microstructure comprising greater than or equal to 40% by volume α-chromium.
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