发明申请
- 专利标题: MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- 专利标题(中): 半导体器件的制造方法
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申请号: US12037984申请日: 2008-02-27
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公开(公告)号: US20080248611A1公开(公告)日: 2008-10-09
- 发明人: Kenji HANADA , Norihisa Toma , Masaki Nakanishi , Takahiro Naito , Naotaka Tanaka
- 申请人: Kenji HANADA , Norihisa Toma , Masaki Nakanishi , Takahiro Naito , Naotaka Tanaka
- 优先权: JP2007-101493 20070409
- 主分类号: H01L21/60
- IPC分类号: H01L21/60
摘要:
The quality and reliability of a semiconductor device can be improved by eliminating a warp of a chip and performing a chip-stack. A wiring substrate, the first semiconductor chip connected via the first gold bump on the wiring substrate, the second semiconductor chip stacked via the second gold bump on the first semiconductor chip, and a sealing body are comprised. A first gold bump is connected to the wiring substrate, heating, and injection by pressure welding of the first gold bump is done under normal temperature after that at the hole-like electrode of the first semiconductor chip. Since injection by pressure welding of the second gold bump of the second semiconductor chip is done under normal temperature into the hole-like electrode of the first semiconductor chip and the second semiconductor chip is stacked, the chip-stack can be performed under normal temperature. The chip after the second stage can be stacked in the state where there is no warp in the first stage chip, by this, and the quality and reliability of the semiconductor device (semiconductor package) can be improved.
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