发明申请
- 专利标题： EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
- 专利标题（中）： 曝光装置及其制造方法
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申请号： US12104562申请日： 2008-04-17
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公开(公告)号： US20080259302A1公开(公告)日： 2008-10-23
- 发明人: Yuji Kojima , Ariyoshi Tsuchiya
- 申请人： Yuji Kojima , Ariyoshi Tsuchiya
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-112298 20070420
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
This invention discloses an exposure apparatus for exposing a substrate to radiant energy in accordance with a recipe including a plurality of elements, the apparatus comprising: a first storage configured to store the plurality of elements; a first processor configured to change a content of a first element stored in the first storage; and a second processor configured to change a content of a second element stored in the first storage, the second element referring to the first element, in accordance with the change performed for the first element.