发明申请
- 专利标题: Method For Coating Substrates With Coating Systems Containing Reactive Hydrophobic Inorganic Fillers
- 专利标题(中): 包含反应性疏水性无机填料的涂层系统涂层基材的方法
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申请号: US12067855申请日: 2006-10-05
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公开(公告)号: US20080261032A1公开(公告)日: 2008-10-23
- 发明人: Edwin Nun , Heike Bergandt
- 申请人: Edwin Nun , Heike Bergandt
- 申请人地址: DE ESSEN
- 专利权人: EVONIK DEGUSSA GMBH
- 当前专利权人: EVONIK DEGUSSA GMBH
- 当前专利权人地址: DE ESSEN
- 优先权: DE102005052938.0 20051103
- 国际申请: PCT/EP06/67090 WO 20061005
- 主分类号: B32B9/00
- IPC分类号: B32B9/00 ; B05D3/02
摘要:
The present invention relates to a process for coating substrates, which comprises the steps: a) provision of a substrate which is not natural stone and/or natural ashlar, b) application of a composition comprising a silane of the general formula (Z1)Si(OR)3, where Z1 is R, OR or Gly (Gly=3-glycidyloxypropyl) and R is an alkyl radical having from 1 to 18 carbon atoms and all radicals R can be identical or different, oxide particles selected from among the oxides of Ti, Si, Zr, Al, Y, Sn, Zn, Ce and mixtures thereof, with bound organic radicals SiR′3 being present on the surface of the oxide particles, where R′ has the general formula CnX1+2n where n=1 to 20, X=hydrogen and/or fluorine, all radicals R′ can be identical or different and the organic radicals SiR′3 being able to be split off, and an initiator to at least one surface of the substrate and c) drying of the composition applied in step b), and a coated substrate which can be obtained by the abovementioned process.
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