发明申请
- 专利标题: Electron Microscope And Electron Beam Inspection System
- 专利标题(中): 电子显微镜和电子束检测系统
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申请号: US12144060申请日: 2008-06-23
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公开(公告)号: US20080265161A1公开(公告)日: 2008-10-30
- 发明人: Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
- 申请人: Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
- 优先权: JP2004-208871 20040715
- 主分类号: G21K7/00
- IPC分类号: G21K7/00
摘要:
An electron microscope includes an electron source, a stage for mounting a specimen, an illuminating lens system that illuminates an electron beam onto the specimen, an imaging lens system that forms a specimen image using a reflecting electron beam of the illuminating electron beam, a beam separator that separates the illuminating electron beam and the reflecting electron beam, a control unit that controls current to be supplied to the beam separator; and a switching unit which enables switching between a first mode and a second mode. The control unit changes a value of the current to be supplied to the beam separator when switching from the first mode to the second mode.
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