Invention Application
US20080280065A1 Method and Device for Generating a Low-Pressure Plasma and Applications of the Low-Pressure Plasma
审中-公开
用于产生低压等离子体的方法和装置以及低压等离子体的应用
- Patent Title: Method and Device for Generating a Low-Pressure Plasma and Applications of the Low-Pressure Plasma
- Patent Title (中): 用于产生低压等离子体的方法和装置以及低压等离子体的应用
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Application No.: US11547854Application Date: 2005-04-01
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Publication No.: US20080280065A1Publication Date: 2008-11-13
- Inventor: Peter Fornsel , Christian Buske , Uwe Hartmann
- Applicant: Peter Fornsel , Christian Buske , Uwe Hartmann
- Priority: DE102004017923.9 20040409
- International Application: PCT/EP2005/003442 WO 20050401
- Main IPC: B01J19/08
- IPC: B01J19/08 ; H05H1/24
Abstract:
The present invention relates to a method for generating a low-pressure plasma, in which a partial vacuum is generated by means of a vacuum pump in a low-pressure chamber, and a plasma jet is introduced at higher pressure into the low-pressure chamber. The present invention also relates to various applications of the low-pressure plasma for surface pretreatment, for surface coating, or for treating gases. The present invention also relates to a device for generating a low-pressure plasma.
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