发明申请
- 专利标题: Semiconductor laser diode and the manufacturing method thereof
- 专利标题(中): 半导体激光二极管及其制造方法
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申请号: US12153681申请日: 2008-05-22
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公开(公告)号: US20080291960A1公开(公告)日: 2008-11-27
- 发明人: Yutaka Inoue , Yasuhisa Semba , Susumu Sorimachi , Kouichi Kouzu
- 申请人: Yutaka Inoue , Yasuhisa Semba , Susumu Sorimachi , Kouichi Kouzu
- 专利权人: OpNext Japan, Inc.
- 当前专利权人: OpNext Japan, Inc.
- 优先权: JP2007-138621 20070525
- 主分类号: H01S5/22
- IPC分类号: H01S5/22 ; H01L33/00
摘要:
A multibeam semiconductor laser diode having: an n-type semiconductor substrate; an n-type clad layer, an active layer, a p-type clad layer and a contact layer; a plurality of partitioning grooves extending from one end to the other end of the substrate and formed from the contact layer to a predetermined depth of the p-type clad layer; a stripe-shaped ridge sandwiched between two separation grooves; an insulating layer covering an area from each side wall of the contact layer of each ridge to an end of the partitioning region via the separation groove; a first electrode formed on a second plane of the substrate; and a second electrode formed in each partitioning region covering an area above the ridge, separation grooves and multilayer semiconductor layers outside the separation grooves, the second electrode being constituted of a lower second electrode layer and an upper second plated layer.
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