发明申请
- 专利标题: SYSTEMS AND METHODS FOR PROCESSING SEMICONDUCTOR STRUCTURES USING LASER PULSES LATERALLY DISTRIBUTED IN A SCANNING WINDOW
- 专利标题(中): 使用在扫描窗口中分布的激光脉冲处理半导体结构的系统和方法
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申请号: US11757232申请日: 2007-06-01
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公开(公告)号: US20080299783A1公开(公告)日: 2008-12-04
- 发明人: Kelly J. Bruland , Mark A. Unrath , Douglas E. Holmgren
- 申请人: Kelly J. Bruland , Mark A. Unrath , Douglas E. Holmgren
- 申请人地址: US OR Portland
- 专利权人: ELECTRO SCIENTIFIC INDUSTRIES, INC.
- 当前专利权人: ELECTRO SCIENTIFIC INDUSTRIES, INC.
- 当前专利权人地址: US OR Portland
- 主分类号: H01L21/26
- IPC分类号: H01L21/26 ; G11B11/00
摘要:
Systems and methods process structures on or within a semiconductor substrate using a series of laser pulses. In one embodiment, a deflector is configured to selectively deflect the laser pulses within a processing window. The processing window is scanned over the semiconductor substrate such that a plurality of laterally spaced rows of structures simultaneously pass through the processing window. As the processing window is scanned, the deflector selectively deflects the series of laser pulses among the laterally spaced rows within the processing window. Thus, multiple rows of structures may be processed in a single scan.