发明申请
- 专利标题: PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- 专利标题(中): 微波投影曝光装置投影目标
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申请号: US12194229申请日: 2008-08-19
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公开(公告)号: US20080304033A1公开(公告)日: 2008-12-11
- 发明人: Bernhard Kneer , Norbert Wabra , Toralf Gruner , Alexander Epple , Susanne Beder , Wolfgang Singer
- 申请人: Bernhard Kneer , Norbert Wabra , Toralf Gruner , Alexander Epple , Susanne Beder , Wolfgang Singer
- 申请人地址: DE Oberkochen
- 专利权人: CARL ZEISS SMT AG
- 当前专利权人: CARL ZEISS SMT AG
- 当前专利权人地址: DE Oberkochen
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/54
摘要:
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.
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