A coordinate measuring machine (1) for the structured illumination of substrates is disclosed. The incident light illumination means (14) and/or the transmitted light illumination means (6) have a pupil access via which at least one optical element (35, 88) is positionable in the optical illumination path (4, 5). The size and/or the type and/or the polarization of the pupil illumination may be manipulated such that the structured illumination of the substrate in the coordinate measuring machine (1) corresponds to the structured illumination of this substrate in the exposure process with a stepper.