发明申请
- 专利标题: THIN POLISHING PAD WITH WINDOW AND MOLDING PROCESS
- 专利标题(中): 具有窗口和成型工艺的薄型抛光垫
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申请号: US12130670申请日: 2008-05-30
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公开(公告)号: US20080305729A1公开(公告)日: 2008-12-11
- 发明人: Dominic J. Benvegnu , Jimin Zhang , Thomas H. Osterheld , Boguslaw A. Swedek
- 申请人: Dominic J. Benvegnu , Jimin Zhang , Thomas H. Osterheld , Boguslaw A. Swedek
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 主分类号: B24D11/00
- IPC分类号: B24D11/00 ; B29C45/14
摘要:
A polishing pad is described that has a polishing layer with a polishing surface, an adhesive layer on a side of the polishing layer opposite the polishing layer, and a solid light-transmitting window extending through and molded to the polishing layer. The window has a top surface coplanar with the polishing surface and a bottom surface coplanar with a lower surface of the adhesive layer. A method of making a polishing pad includes forming an aperture through a polishing layer and an adhesive layer, securing a backing piece to the adhesive layer on a side opposite a polishing surface of the polishing layer, dispensing a liquid polymer into the aperture, and curing the liquid polymer to form a window.
公开/授权文献
- US08562389B2 Thin polishing pad with window and molding process 公开/授权日:2013-10-22
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