发明申请
- 专利标题: ELECTRICAL FUSE WITH SUBLITHOGRAPHIC DIMENSION
- 专利标题(中): 电子保险丝
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申请号: US11761403申请日: 2007-06-12
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公开(公告)号: US20080308900A1公开(公告)日: 2008-12-18
- 发明人: Deok-kee Kim , Wai-Kin Li , Haining S. Yang
- 申请人: Deok-kee Kim , Wai-Kin Li , Haining S. Yang
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L29/00
- IPC分类号: H01L29/00 ; G03F1/00
摘要:
A photolithography mask contains at least one sublithographic assist feature (SLAF) such that the image of the fuselink shape on a photoresist contains a constructive interference portion and two neck portions. The width of the constructive interference portion is substantially the same as a critical dimension of the lithography tool and the widths of the two neck portions are sublithographic dimensions. The image on a photoresist is subsequently transferred into an underlying semiconductor layer to form an electrical fuse. The fuselink contains a constructive interference portion having a first width which is substantially the same as the critical dimension of the lithography tool and two neck portions having sublithographic widths. The inventive electrical fuse may be programmed with less voltage bias, current, and energy compared to prior art electrical fuses.