发明申请
- 专利标题： PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND METHOD FOR PATTERN FORMING
- 专利标题（中）： 感光树脂组合物，感光树脂层压板及其形成方法
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申请号： US12136354申请日： 2008-06-10
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公开(公告)号： US20080311511A1公开(公告)日： 2008-12-18
- 发明人: Takahiro Senzaki , Koichi Misumi , Koji Saito
- 申请人： Takahiro Senzaki , Koichi Misumi , Koji Saito
- 申请人地址： JP Kawasaki-shi
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kawasaki-shi
- 优先权： JP2007-158320 20070615
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/004 ; C08F2/50
摘要：
A photosensitive resin composition, a photosensitive resin laminate, and a method for forming a pattern capable of realizing high hardness while using an epoxy group-containing acrylic resin are provided. In a photosensitive resin composition including (A) an epoxy group-containing acrylic resin, (B) a photopolymerization initiator, and (C) a sensitizer, an onium salt having a specific structure is used as the component (B), and at least one kind selected from 1,5-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and 2,6-dihydroxynaphthalene is used as the component (C).
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