发明申请
US20080312088A1 Field effect transistor, logic circuit including the same and methods of manufacturing the same
有权
场效应晶体管,逻辑电路包括相同的方法和制造方法相同
- 专利标题: Field effect transistor, logic circuit including the same and methods of manufacturing the same
- 专利标题(中): 场效应晶体管,逻辑电路包括相同的方法和制造方法相同
-
申请号: US12005372申请日: 2007-12-27
-
公开(公告)号: US20080312088A1公开(公告)日: 2008-12-18
- 发明人: Hyun-jong Chung , Ran-ju Jung , Sun-ae Seo , Dong-chul Kim , Chang-won Lee
- 申请人: Hyun-jong Chung , Ran-ju Jung , Sun-ae Seo , Dong-chul Kim , Chang-won Lee
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2007-0058009 20070613
- 主分类号: H01L29/24
- IPC分类号: H01L29/24 ; H01L21/336 ; H01L21/84
摘要:
Provided are a field effect transistor, a logic circuit including the same and methods of manufacturing the same. The field effect transistor may include an ambipolar layer that includes a source region, a drain region, and a channel region between the source region and the drain region, wherein the source region, the drain region, and the channel region may be formed in a monolithic structure, a gate electrode on the channel region, and an insulating layer separating the gate electrode from the ambipolar layer, wherein the source region and the drain region have a width greater than that of the channel region in a second direction that crosses a first direction in which the source region and the drain region are connected to each other.
公开/授权文献
信息查询
IPC分类: