发明申请
US20080316644A1 PMR with improved writability and process controllability by double layer patterning
有权
PMR具有改进的可编写性和工艺可控性,通过双层图案化
- 专利标题: PMR with improved writability and process controllability by double layer patterning
- 专利标题(中): PMR具有改进的可编写性和工艺可控性,通过双层图案化
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申请号: US11820962申请日: 2007-06-21
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公开(公告)号: US20080316644A1公开(公告)日: 2008-12-25
- 发明人: Jiun-Ting Lee , Shiwen Huang , Moris Dovek
- 申请人: Jiun-Ting Lee , Shiwen Huang , Moris Dovek
- 专利权人: Headway Technologies, Inc.
- 当前专利权人: Headway Technologies, Inc.
- 主分类号: G11B5/127
- IPC分类号: G11B5/127 ; G11B5/147 ; B44C1/22
摘要:
Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.