发明申请
- 专利标题: Capacitor and Method for Manufacturing Same
- 专利标题(中): 电容器及制造方法相同
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申请号: US12159699申请日: 2006-12-27
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公开(公告)号: US20080316681A1公开(公告)日: 2008-12-25
- 发明人: Hideki Oohata , Akihiko Shirakawa
- 申请人: Hideki Oohata , Akihiko Shirakawa
- 申请人地址: JP Minato-ku, Tokyo
- 专利权人: SHOWA DENKO K.K.
- 当前专利权人: SHOWA DENKO K.K.
- 当前专利权人地址: JP Minato-ku, Tokyo
- 优先权: JP2005-377040 20051228
- 国际申请: PCT/JP2006/326092 WO 20061227
- 主分类号: H01G4/06
- IPC分类号: H01G4/06
摘要:
The present invention relates to a capacitor having high capacitance, low ESR (equivalent series resistance) in a high-frequency region and low leakage current, comprising a composite oxide film obtained by reaction of an oxide film obtained by subjecting the surface of the substrate comprising valve-acting metal element with a solution in which metal ion and an organic base are dissolved and by subsequently sintering the reactant, a solid electrolyte formed on the composite oxide film and a conductor layer formed thereon; a method for producing the same and electronic devices using the same.
公开/授权文献
- US07697267B2 Capacitor and method for manufacturing same 公开/授权日:2010-04-13
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