发明申请
US20080316681A1 Capacitor and Method for Manufacturing Same 失效
电容器及制造方法相同

  • 专利标题: Capacitor and Method for Manufacturing Same
  • 专利标题(中): 电容器及制造方法相同
  • 申请号: US12159699
    申请日: 2006-12-27
  • 公开(公告)号: US20080316681A1
    公开(公告)日: 2008-12-25
  • 发明人: Hideki OohataAkihiko Shirakawa
  • 申请人: Hideki OohataAkihiko Shirakawa
  • 申请人地址: JP Minato-ku, Tokyo
  • 专利权人: SHOWA DENKO K.K.
  • 当前专利权人: SHOWA DENKO K.K.
  • 当前专利权人地址: JP Minato-ku, Tokyo
  • 优先权: JP2005-377040 20051228
  • 国际申请: PCT/JP2006/326092 WO 20061227
  • 主分类号: H01G4/06
  • IPC分类号: H01G4/06
Capacitor and Method for Manufacturing Same
摘要:
The present invention relates to a capacitor having high capacitance, low ESR (equivalent series resistance) in a high-frequency region and low leakage current, comprising a composite oxide film obtained by reaction of an oxide film obtained by subjecting the surface of the substrate comprising valve-acting metal element with a solution in which metal ion and an organic base are dissolved and by subsequently sintering the reactant, a solid electrolyte formed on the composite oxide film and a conductor layer formed thereon; a method for producing the same and electronic devices using the same.
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