发明申请
US20080318008A1 Method and Apparatus for Application of a Pattern, Element and Device Provided with Such a Pattern
审中-公开
用于具有这种图案的图案,元件和装置的应用的方法和装置
- 专利标题: Method and Apparatus for Application of a Pattern, Element and Device Provided with Such a Pattern
- 专利标题(中): 用于具有这种图案的图案,元件和装置的应用的方法和装置
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申请号: US11574659申请日: 2005-08-30
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公开(公告)号: US20080318008A1公开(公告)日: 2008-12-25
- 发明人: Ytsen Wielstra , Jolanda Harma Sagitta Van De Woudewinkel , Gerrit Jan De Jong , Rien Vugts
- 申请人: Ytsen Wielstra , Jolanda Harma Sagitta Van De Woudewinkel , Gerrit Jan De Jong , Rien Vugts
- 申请人地址: NL EINDHOVEN
- 专利权人: KONINKLIJKE PHILIPS ELECTRONICS, NV
- 当前专利权人: KONINKLIJKE PHILIPS ELECTRONICS, NV
- 当前专利权人地址: NL EINDHOVEN
- 优先权: EP04104244.1 20040903
- 国际申请: PCT/IB2005/052828 WO 20050830
- 主分类号: B32B3/00
- IPC分类号: B32B3/00 ; B05D3/06 ; B05C11/02
摘要:
The invention relates to a method and apparatus for application of a decorative pattern to a substrate coated with a coating layer, an element comprising a surface coated with a coating layer with such a pattern, as well as a device provided with such an element. The method employs laser ablation of the pattern in a coating layer, followed by the application of ink in the laser-ablated pattern. The method according to the invention is more flexible with respect to the nature of the coating than known methods.
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