发明申请
- 专利标题: METHOD FOR PRODUCING A SUPPORT FOR THE GROWTH OF LOCALISED ELONGATED NANOSTRUCTURES
- 专利标题(中): 用于生产局部拉伸纳米结构生长的方法
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申请号: US11625043申请日: 2007-01-19
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公开(公告)号: US20080318366A1公开(公告)日: 2008-12-25
- 发明人: Frank Fournel , Jean Dijon , Pierre Mur
- 申请人: Frank Fournel , Jean Dijon , Pierre Mur
- 申请人地址: FR Paris
- 专利权人: COMMISSARIAT A L'ENERGIE ATOMIQUE
- 当前专利权人: COMMISSARIAT A L'ENERGIE ATOMIQUE
- 当前专利权人地址: FR Paris
- 优先权: FR0650235 20060123
- 主分类号: H01L21/20
- IPC分类号: H01L21/20
摘要:
The invention relates to a method for producing a support comprising nanoparticles (22) for the growth of nanostructures (23), said nanoparticles being organised periodically, the method being characterised in that it comprises the following steps: providing a support comprising, in the vicinity of one of its surfaces, a periodic array of crystal defects and/or stress fields (18), depositing, on said surface, a continuous layer (20) of a first material capable of catalysing the nanostructure growth reaction, fractionating the first material layer (20) by a heat treatment so as to form the first material nanoparticles (22). The invention also relates to a method for producing nanostructures from said support.
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