发明申请
- 专利标题: PROCESS FOR PRODUCING POLYCRYSTALLINE BULK SEMICONDUCTOR
- 专利标题(中): 生产多晶硅半导体的方法
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申请号: US12130863申请日: 2008-05-30
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公开(公告)号: US20090000536A1公开(公告)日: 2009-01-01
- 发明人: Kozo Fujiwara , Kazuo Nakajima
- 申请人: Kozo Fujiwara , Kazuo Nakajima
- 申请人地址: JP Miyagi
- 专利权人: Tohoku University
- 当前专利权人: Tohoku University
- 当前专利权人地址: JP Miyagi
- 优先权: JP2005-345042 20051130
- 主分类号: C30B9/04
- IPC分类号: C30B9/04
摘要:
A high-quality polycrystalline bulk semiconductor having a large crystal grain size is produced by the casting method in which growth is regulated so as to proceed in the same plane direction, i.e., the {110}; plane or {112} plane is disclosed. The process, which is for producing a polycrystalline bulk semiconductor, comprises: a step in which a melt of a semiconductor selected among Si, Ge, and SiGe is held in a crucible; a step in which a bottom part of the crucible is cooled to give a temperature gradient and that part of the melt which is located directly on the crucible bottom is rapidly cooled in the beginning of growth to supercool the melt around the crucible bottom; a step in which the crucible is cooled to grow nuclei on the crucible bottom due to the supercooled state of the melt around the crucible bottom and thereby grow dendritic crystals along the crucible bottom; and a step in which a polycrystalline bulk of the semiconductor is then grown on the upper side of the dendritic crystals.
公开/授权文献
- US08404043B2 Process for producing polycrystalline bulk semiconductor 公开/授权日:2013-03-26
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