发明申请
- 专利标题: Isolation of MIM FIN DRAM capacitor
- 专利标题(中): MIM FIN DRAM电容器的隔离
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申请号: US11824499申请日: 2007-06-29
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公开(公告)号: US20090001438A1公开(公告)日: 2009-01-01
- 发明人: Brian S. Doyle , Dinesh Somasekhar , Robert S. Chau , Suman Datta
- 申请人: Brian S. Doyle , Dinesh Somasekhar , Robert S. Chau , Suman Datta
- 主分类号: H01L29/94
- IPC分类号: H01L29/94 ; H01L21/20
摘要:
In one embodiment, a capacitor comprises a substrate, a first electrically insulating layer over the substrate, a fin comprising a semiconducting material over the first electrically insulating layer, a cap formed from a silicide material on the first semiconducting fin, a first electrically conducting layer over the first electrically insulating layer and adjacent to the fin, a second electrically insulating layer adjacent to the first electrically conducting layer and a second electrically conducting layer adjacent to the second electrically insulating layer.
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