发明申请
- 专利标题： EXPOSURE APPARATUS HAVING THE SAME ID BIAS
- 专利标题（中）： 具有同一ID偏差的曝光装置
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申请号： US11952448申请日： 2007-12-07
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公开(公告)号： US20090002672A1公开(公告)日： 2009-01-01
- 发明人: Hyun Jo Yang
- 申请人： Hyun Jo Yang
- 申请人地址： KR Icheon-Si
- 专利权人： HYNIX SEMICONDUCTOR INC.
- 当前专利权人： HYNIX SEMICONDUCTOR INC.
- 当前专利权人地址： KR Icheon-Si
- 优先权： KR10-2007-0063923 20070627
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
An exposure apparatus includes an exposure light source generating light to be emitted to photomask, a projection lens for projecting the light having passed through the photomask to wafer, and a transmittance adjustment filter in projection lens the transmittance adjustment filter varies the transmittance of the light projected into the projection lens as a function of position in the projection lens.
公开/授权文献
- US07932998B2 Exposure apparatus having the same ID bias 公开/授权日：2011-04-26