发明申请
- 专利标题： WAFER AND STAGE ALIGNMENT USING PHOTONIC DEVICES
- 专利标题（中）： 使用光电器件的波形和阶段对准
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申请号： US11770105申请日： 2007-06-28
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公开(公告)号： US20090002721A1公开(公告)日： 2009-01-01
- 发明人: Shahin Zangooie , Lin Zhou
- 申请人： Shahin Zangooie , Lin Zhou
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G01B11/14
- IPC分类号： G01B11/14
摘要：
A position sensing system for an optical metrology system, includes a plurality of photonic devices distributed on a carrier for providing a photonic response when interrogated with a measuring light, wherein a collective photonic response from the plurality indicates the position of the carrier. A method and an optical metrology system are also provided.
公开/授权文献
- US07808657B2 Wafer and stage alignment using photonic devices 公开/授权日：2010-10-05
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