发明申请
- 专利标题： SUBSTRATE PROCESSING SYSTEM
- 专利标题（中）： 基板加工系统
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申请号： US12137076申请日： 2008-06-11
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公开(公告)号： US20090003825A1公开(公告)日： 2009-01-01
- 发明人: Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
- 申请人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
- 申请人地址： JP Minato-ku
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Minato-ku
- 优先权： JP2007-172389 20070629
- 主分类号： G03D3/08
- IPC分类号： G03D3/08
摘要：
A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette.
公开/授权文献
- US08206076B2 Substrate processing system 公开/授权日：2012-06-26