发明申请
- 专利标题: Processing method and processing apparatus
- 专利标题(中): 处理方法和处理装置
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申请号: US12230943申请日: 2008-09-08
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公开(公告)号: US20090011523A1公开(公告)日: 2009-01-08
- 发明人: Glenn GALE
- 申请人: Glenn GALE
- 优先权: JPJP2004-304471 20041019
- 主分类号: H01L21/302
- IPC分类号: H01L21/302
摘要:
A processing method of subjecting at least two stacked films, which comprise a first film and a second film of a target object to be processed, to a removing process by wet etching comprises bringing a first process liquid into contact with the first film of the target object, thereby etching the first film, determining whether the first film has been removed or not, switching the first process liquid to a second process liquid differing in a condition from the first process liquid when it has been determined that the first film has been removed, and bringing the second process liquid into contact with the second film, thereby etching the second film.
公开/授权文献
- US08043521B2 Processing apparatus 公开/授权日:2011-10-25