发明申请
US20090015844A1 Interferometry Method for Ellipsometry, Reflectometry, and Scatterometry Measurements, Including Characterization of Thin Film Structures 有权
用于椭圆偏振,反射和散射测量的干涉测量方法,包括薄膜结构的表征

  • 专利标题: Interferometry Method for Ellipsometry, Reflectometry, and Scatterometry Measurements, Including Characterization of Thin Film Structures
  • 专利标题(中): 用于椭圆偏振,反射和散射测量的干涉测量方法,包括薄膜结构的表征
  • 申请号: US12173972
    申请日: 2008-07-16
  • 公开(公告)号: US20090015844A1
    公开(公告)日: 2009-01-15
  • 发明人: PETER J. DE GROOT
  • 申请人: PETER J. DE GROOT
  • 主分类号: G01B11/00
  • IPC分类号: G01B11/00
Interferometry Method for Ellipsometry, Reflectometry, and Scatterometry Measurements, Including Characterization of Thin Film Structures
摘要:
A method including: imaging test light emerging from a test object over a range of angles to interfere with reference light on a detector, wherein the test and reference light are derived from a common source; for each of the angles, simultaneously varying an optical path length difference from the source to the detector between interfering portions of the test and reference light at a rate that depends on the angle at which the test light emerges from the test object; and determining an angle-dependence of an optical property of the test object based on the interference between the test and reference light as the optical path length difference is varied for each of the angles.
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