发明申请
- 专利标题： Method of forming thin film patterning substrate including formation of banks
- 专利标题（中）： 包括形成堤的薄膜构图衬底的形成方法
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申请号： US12232421申请日： 2008-09-17
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公开(公告)号： US20090020751A1公开(公告)日： 2009-01-22
- 发明人: Shunichi Seki , Hiroshi Kiguchi , Ichio Yudasaka , Hiroo Miyajima
- 申请人： Shunichi Seki , Hiroshi Kiguchi , Ichio Yudasaka , Hiroo Miyajima
- 申请人地址： JP TOKYO
- 专利权人： SEIKO EPSON CORPORATION
- 当前专利权人： SEIKO EPSON CORPORATION
- 当前专利权人地址： JP TOKYO
- 优先权： JP10-067508 19980317; JP11-032123 19990210
- 主分类号： H01L51/00
- IPC分类号： H01L51/00 ; H01L21/20
摘要：
Display devices such as EL elements or LED elements, are formed from thin film elements having banks of prescribed height and a thin film layer formed by an ink jet method in areas to be coated that are partitioned by those banks. The banks may be formed of an organic material on a bank formation surface configured of an inorganic material, plasma treatment is performed under conditions that the induction gas is fluorine-based and that fluorine is present excessively, and the areas enclosed by the banks subjected to surface treatment are filled with the liquid thin film material to form the thin film layer or layers.