发明申请
- 专利标题: OPTICAL ELEMENT POSITIONING APPARATUS, PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS
- 专利标题(中): 光学元件定位装置,投影光学系统和曝光装置
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申请号: US12171644申请日: 2008-07-11
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公开(公告)号: US20090021847A1公开(公告)日: 2009-01-22
- 发明人: Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
- 申请人: Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-186924 20070718
- 主分类号: G02B7/00
- IPC分类号: G02B7/00
摘要:
The apparatus includes a holder holding an optical element, a back plate supporting the optical element via the holder, a mechanism moving the optical element in a six-degree-of-freedom, a base plate supporting the back plate via the mechanism, and six displacement sensors disposed on the base plate and measuring displacement amounts of different points on the optical element. The displacement sensors includes three ones measuring them in a first direction, one measuring it in a second direction, and two ones measuring them in a third direction. The apparatus further includes a transformation processor transforming the six measured displacement amounts into displacement amounts of the optical element in the six-degree-of-freedom, a calibration processor calibrating the transformed displacement amounts, and a controller outputting command values to the displacing mechanism based on differences between the calibrated displacement amounts and target displacement amounts of the optical element.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |