发明申请
US20090025753A1 Lithographic Apparatus And Contamination Removal Or Prevention Method
审中-公开
平版印刷设备和污染物去除或预防方法
- 专利标题： Lithographic Apparatus And Contamination Removal Or Prevention Method
- 专利标题（中）： 平版印刷设备和污染物去除或预防方法
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申请号： US11862873申请日： 2007-09-27
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公开(公告)号： US20090025753A1公开(公告)日： 2009-01-29
- 发明人: Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
- 申请人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： B08B3/04
- IPC分类号： B08B3/04 ; B08B3/08
摘要：
A lithographic apparatus is disclosed having an in situ ozonizer, which is used to produce ozone gas, for example, by UV irradiation of an oxygen-containing gas. The thus produced ozone is dissolved in ultra-pure water by contacting the ozone with the ultra-pure water through a permeable membrane.
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