Invention Application
US20090025878A1 PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS ELEMENTS
有权
使用电子旁路元件的减少电机的等离子体反应器
- Patent Title: PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS ELEMENTS
- Patent Title (中): 使用电子旁路元件的减少电机的等离子体反应器
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Application No.: US11828568Application Date: 2007-07-26
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Publication No.: US20090025878A1Publication Date: 2009-01-29
- Inventor: Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
- Applicant: Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
- Main IPC: H01L21/306
- IPC: H01L21/306
Abstract:
RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.
Public/Granted literature
- US07988815B2 Plasma reactor with reduced electrical skew using electrical bypass elements Public/Granted day:2011-08-02
Information query
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