发明申请
- 专利标题： Exposure apparatus
- 专利标题（中）： 曝光装置
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申请号： US12232967申请日： 2008-09-26
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公开(公告)号： US20090027642A1公开(公告)日： 2009-01-29
- 发明人: Arjen Boogaard , Timotheus Franciscus Sengers , Wilhelmus Sebastianus Marcus Maria Ketelaars , Carolus Ida Maria Spee
- 申请人： Arjen Boogaard , Timotheus Franciscus Sengers , Wilhelmus Sebastianus Marcus Maria Ketelaars , Carolus Ida Maria Spee
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. At least a part of the apparatus that during use of the apparatus is exposed to radiation is coated with a coating. The coating includes a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.
公开/授权文献
- US08542341B2 Exposure apparatus 公开/授权日：2013-09-24