发明申请
- 专利标题： EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
- 专利标题（中）： 曝光装置和装置制造方法
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申请号： US12172298申请日： 2008-07-14
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公开(公告)号： US20090027647A1公开(公告)日： 2009-01-29
- 发明人: Yoshiyuki Nagai , Kazuhiro Takahashi , Akihiro Yamada
- 申请人： Yoshiyuki Nagai , Kazuhiro Takahashi , Akihiro Yamada
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-192649 20070724
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle including a pellicle with light from a light source, a projection optical system configured to project a pattern of the reticle onto a substrate, an obtaining unit configured to obtain information on a thickness of the pellicle, an adjusting unit configured to adjust an illuminance on the substrate, and a control unit configured to control the adjusting unit based on the information on the thickness of the pellicle obtained by the obtaining unit.
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