发明申请
- 专利标题： WET CLEAN PROCESS FOR RECOVERY OF ANODIZED CHAMBER PARTS
- 专利标题（中）： 用于回收阳极室部件的净化过程
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申请号： US11845620申请日： 2007-08-27
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公开(公告)号： US20090056745A1公开(公告)日： 2009-03-05
- 发明人: JENNIFER Y. SUN , Senh Thach , Xi Zhu , Li Xu , Anisul Khan
- 申请人： JENNIFER Y. SUN , Senh Thach , Xi Zhu , Li Xu , Anisul Khan
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： C23G1/02
- IPC分类号： C23G1/02
摘要：
A cleaning process for recovering an anodized aluminum part is particularly useful when the part has been exposed to a fluorine-containing plasma in etch reactor. The part is bathed in an agitated solution of a fluoride acid, such as ammonium fluoride, which converts aluminum fluoride to a soluble fluoride. The part is rinsed in water. The pores of the cleaned anodization may be resealed by a submerging the part in hot agitated deionized water.
公开/授权文献
- US08231736B2 Wet clean process for recovery of anodized chamber parts 公开/授权日：2012-07-31