发明申请
- 专利标题: METHOD FOR PRODUCING TRICHLOROSILANE AND METHOD FOR PRODUCING POLYCRYSTALLINE SILICON
- 专利标题(中): 生产三氯硅烷的方法和生产多晶硅的方法
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申请号: US12135487申请日: 2008-06-09
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公开(公告)号: US20090057129A1公开(公告)日: 2009-03-05
- 发明人: Takaaki Shimizu , Kyoji Oguro
- 申请人: Takaaki Shimizu , Kyoji Oguro
- 申请人地址: JP Chiyoda-ku
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Chiyoda-ku
- 优先权: JP2007-229858 20070905
- 主分类号: B01D3/34
- IPC分类号: B01D3/34
摘要:
A hydrogenation reaction vessel makes STC-containing substance react with hydrogen to convert the substance into TCS. A low boils removal column separates a chlorosilane distillate discharged from a hydrogenation reaction vessel into TCS and a mixture distillate containing hyper-hydrogenated chlorosilane, and circulates the mixture distillate containing hyper-hydrogenated chlorosilane to the hydrogenation reaction vessel. The mixture distillate containing the hyper-hydrogenated chlorosilane separated in the low boils removal column is circulatingly supplied to the hydrogenation reaction vessel. Accordingly, low boils by-product conventionally wasted is circulated and recycled in the process, which results in enhancing a yield of TCS production.