发明申请
US20090061538A1 Methods of forming ferroelectric capacitors and methods of manufacturing semiconductor devices using the same 审中-公开
形成铁电电容器的方法和使用其制造半导体器件的方法

Methods of forming ferroelectric capacitors and methods of manufacturing semiconductor devices using the same
摘要:
In a method of forming a ferroelectric capacitor, a lower electrode layer is formed on a substrate. A first crystalline layer is formed on the lower electrode layer. A ferroelectric layer is formed on the first crystalline layer. The first crystalline layer one of prevents a component of the ferroelectric layer from diffusing into the lower electrode layer and mitigates fatigue of the ferroelectric layer. An upper electrode layer is formed on the ferroelectric layer.
信息查询
0/0