发明申请
- 专利标题: Methods of forming ferroelectric capacitors and methods of manufacturing semiconductor devices using the same
- 专利标题(中): 形成铁电电容器的方法和使用其制造半导体器件的方法
-
申请号: US12222700申请日: 2008-08-14
-
公开(公告)号: US20090061538A1公开(公告)日: 2009-03-05
- 发明人: Jang-Eun Heo , Choong-Man Lee , Ik-Soo Kim , Dong-Hyun Im
- 申请人: Jang-Eun Heo , Choong-Man Lee , Ik-Soo Kim , Dong-Hyun Im
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 优先权: KR10-2007-0082151 20070816
- 主分类号: H01L21/02
- IPC分类号: H01L21/02
摘要:
In a method of forming a ferroelectric capacitor, a lower electrode layer is formed on a substrate. A first crystalline layer is formed on the lower electrode layer. A ferroelectric layer is formed on the first crystalline layer. The first crystalline layer one of prevents a component of the ferroelectric layer from diffusing into the lower electrode layer and mitigates fatigue of the ferroelectric layer. An upper electrode layer is formed on the ferroelectric layer.
信息查询
IPC分类: