发明申请
US20090065764A1 Methods and devices for forming nanostructure monolayers and devices including such monolayers
有权
用于形成纳米结构单层的方法和装置以及包括这种单层的装置
- 专利标题： Methods and devices for forming nanostructure monolayers and devices including such monolayers
- 专利标题（中）： 用于形成纳米结构单层的方法和装置以及包括这种单层的装置
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申请号： US12291101申请日： 2008-11-05
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公开(公告)号： US20090065764A1公开(公告)日： 2009-03-12
- 发明人: David L. Heald , Karen Chu Cruden , Xiangfeng Duan , Chao Liu , J. Wallace Parce
- 申请人： David L. Heald , Karen Chu Cruden , Xiangfeng Duan , Chao Liu , J. Wallace Parce
- 申请人地址： US CA Palo Alto
- 专利权人： NANOSYS, Inc.
- 当前专利权人： NANOSYS, Inc.
- 当前专利权人地址： US CA Palo Alto
- 主分类号： H01L29/00
- IPC分类号： H01L29/00 ; H01L29/06
摘要：
Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).