发明申请
- 专利标题： METHOD FOR PRODUCING INDAZOL-3-YLMETHYL PHOSPHONIUM SALT
- 专利标题（中）： 生产辛烷-3-基甲基硫酸盐的方法
-
申请号： US11912355申请日： 2006-04-28
-
公开(公告)号： US20090069568A1公开(公告)日： 2009-03-12
- 发明人: Koji Hagihara , Tsutomu Matsumura , Masahiro Hoshikawa , Iwao Chujo
- 申请人： Koji Hagihara , Tsutomu Matsumura , Masahiro Hoshikawa , Iwao Chujo
- 申请人地址： JP Chiyoda-ku, Tokyo
- 专利权人： KYOWA HAKKO KOGYO CO., LTD.
- 当前专利权人： KYOWA HAKKO KOGYO CO., LTD.
- 当前专利权人地址： JP Chiyoda-ku, Tokyo
- 优先权： JP2005-130705 20050428
- 国际申请： PCT/JP2006/309001 WO 20060428
- 主分类号： C07F9/645
- IPC分类号： C07F9/645
摘要：
The present invention provides a method for producing an indazol-3-ylmethyl phosphonium salt represented by Formula (IV): [wherein X represents halogen, OSO2Ra (wherein Ra represents substituted or unsubstituted lower alkyl, substituted or unsubstituted aryl or the like), or OC(═O)Rb (wherein Rb has the same meaning as the above Ra), or the like, and R1, R2 and R3 may be the same or different and each represents substituted or unsubstituted aryl or the like] or a salt thereof, which comprises reacting a compound represented by Formula (I): a compound represented by Formula (II): H—X (II) (wherein X has the same meaning as defined above), and a compound represented by Formula (III): (wherein R1, R2 and R3 have the same meanings as defined above, respectively), and the like.
公开/授权文献
- US07759491B2 Method for producing indazol-3-ylmethyl phosphonium salt 公开/授权日：2010-07-20
信息查询
