Invention Application
US20090075178A1 Mask with Registration Marks and Method of Fabricating Integrated Circuits
有权
具有注册标记的面具和制造集成电路的方法
- Patent Title: Mask with Registration Marks and Method of Fabricating Integrated Circuits
- Patent Title (中): 具有注册标记的面具和制造集成电路的方法
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Application No.: US11855234Application Date: 2007-09-14
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Publication No.: US20090075178A1Publication Date: 2009-03-19
- Inventor: Andreas Jahnke , Ralf Ziebold , Torsten Maehr
- Applicant: Andreas Jahnke , Ralf Ziebold , Torsten Maehr
- Applicant Address: DE Munich
- Assignee: QIMONDA AG
- Current Assignee: QIMONDA AG
- Current Assignee Address: DE Munich
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A photomask for a lithography apparatus includes a chip pattern configured to be transferred into a resist layer on a workpiece and at least one registration mark that is configured not to be transferred into the resist layer. Mask qualification may be improved without impacting wafer level processes.
Public/Granted literature
- US07939224B2 Mask with registration marks and method of fabricating integrated circuits Public/Granted day:2011-05-10
Information query
