发明申请
- 专利标题： HEATING APPARATUS AND HEATING METHOD
- 专利标题（中）： 加热装置和加热方法
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申请号： US11913258申请日： 2006-05-19
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公开(公告)号： US20090075225A1公开(公告)日： 2009-03-19
- 发明人: Masayuki Nakagiri , Ryoichi Sugihara , Nobuyasu Akiyoshi
- 申请人： Masayuki Nakagiri , Ryoichi Sugihara , Nobuyasu Akiyoshi
- 申请人地址： JP Minato-ku, Tokyo
- 专利权人： FUJIFILM CORPORATION
- 当前专利权人： FUJIFILM CORPORATION
- 当前专利权人地址： JP Minato-ku, Tokyo
- 优先权： JP2005-147908 20050520; JP2005-213045 20050722
- 国际申请： PCT/JP2006/310502 WO 20060519
- 主分类号： F27B9/02
- IPC分类号： F27B9/02
摘要：
A heating apparatus has first through fifth heating furnace arranged along the feeding direction in which glass substrates are fed by a feeding mechanism. The first heating furnace has a first heater for heating a glass substrate to at least a target temperature required for processing the workpiece. The second heating furnace has a heater for heating a glass substrate to a temperature equal to or below the target temperature. The second heating furnace generates an amount of heat smaller than that of the first heating furnace.
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