发明申请
- 专利标题: METHOD FOR FORMING CONDUCTIVE POST, METHOD FOR MANUFACTURING MULTILAYERED WIRING SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC APPARATUS
- 专利标题(中): 形成导电柱的方法,制造多层布线基板的方法以及制造电子装置的方法
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申请号: US12206800申请日: 2008-09-09
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公开(公告)号: US20090077798A1公开(公告)日: 2009-03-26
- 发明人: Toshimitsu HIRAI , Tsuyoshi SHINTATE , Jun YAMADA
- 申请人: Toshimitsu HIRAI , Tsuyoshi SHINTATE , Jun YAMADA
- 申请人地址: JP Tokyo
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-245305 20070921
- 主分类号: H05K3/00
- IPC分类号: H05K3/00 ; H01R43/16
摘要:
A method for forming a conductive post include: a) forming a liquid repellent portion having a thickness of 100 nm or less by disposing a liquid repellent material in a conductive post forming region on a conductive layer; b) forming an insulation layer having an opening in a region overlapping with the conductive post forming region by disposing a liquid including an insulation layer forming material on the conductive layer having the liquid repellent portion formed thereon and polymerizing the insulation layer forming material; c) disposing metal particulates in the opening; and d) heating the metal particulates at a fusing temperature of the metal particulates or higher so as to fusion bond the metal particulates to each other in order to form the conductive post, and to fusion bond the metal particulates and the conductive layer in order to couple the conductive post with the conductive layer.
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