发明申请
US20090081567A1 SOFT PELLICLE AND METHOD OF MAKING SAME 失效
软胶囊及其制备方法

SOFT PELLICLE AND METHOD OF MAKING SAME
摘要:
The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm, 167 nm, 193 nm, 248 nm, 365 nm, and 436 nm soft pellicles and the use of perfluorinated polymers in the creation of pellicles.
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