发明申请
- 专利标题: Photovoltaic Cells and Manufacture Method
- 专利标题(中): 光伏电池及制造方法
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申请号: US12190615申请日: 2008-08-13
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公开(公告)号: US20090084442A1公开(公告)日: 2009-04-02
- 发明人: Hiroto Naito , Naoki Yoshimoto
- 申请人: Hiroto Naito , Naoki Yoshimoto
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 优先权: JP2007-252953 20070928
- 主分类号: H01L31/0256
- IPC分类号: H01L31/0256 ; H01L31/18
摘要:
The present invention provides photovoltaic cells that stably increase photovoltaic conversion efficiency while restraining current leakage. The photovoltaic cells of the present invention include a transparent conductive layer formed on a light-permeable substrate, an organic semiconductor layer A covering the surface of the transparent conductive layer, a photovoltaic conversion layer in contact with the organic semiconductor layer, an organic semiconductor layer B in contact with the photovoltaic conversion layer, and a counter electrode in contact with the organic semiconductor layer B. In the photovoltaic cells, a patterned indented interlayer is formed at the interface between the organic semiconductor layer A and the photovoltaic conversion layer. With the patterned indented interlayer at the interface between the organic semiconductor layer A and the photovoltaic conversion layer, the interface between the organic semiconductor layer A and the photovoltaic conversion layer has a specific surface area 1.5 to 10 times as large as the interface between the transparent conductive layer and the organic semiconductor layer A.
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