发明申请
- 专利标题: TECHNIQUES FOR CONTROLLING A CHARGED PARTICLE BEAM
- 专利标题(中): 用于控制充电颗粒光束的技术
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申请号: US11865336申请日: 2007-10-01
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公开(公告)号: US20090085504A1公开(公告)日: 2009-04-02
- 发明人: Piotr R. Lubicki , Russell J. Low , Stephen E. Krause , Frank Sinclair
- 申请人: Piotr R. Lubicki , Russell J. Low , Stephen E. Krause , Frank Sinclair
- 申请人地址: US MA Gloucester
- 专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址: US MA Gloucester
- 主分类号: H05H7/00
- IPC分类号: H05H7/00
摘要:
Techniques for controlling a charged particle beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as a charged particle acceleration/deceleration system. The charged particle acceleration/deceleration system may comprise an accelerator column, which may comprise a plurality of electrodes. The plurality of electrodes may have apertures through which a charged particle beam may pass. The charged particle acceleration/deceleration system may also comprise a voltage grading system. The voltage grading system may comprise a first fluid reservoir and a first fluid circuit. The first fluid circuit may have conductive connectors connecting to at least one of the plurality of electrodes. The voltage grading system may further comprise fluid in the first fluid circuit. The fluid may have an electrical resistance.
公开/授权文献
- US07821213B2 Techniques for controlling a charged particle beam 公开/授权日:2010-10-26
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