发明申请
- 专利标题: COPPER CONTAMINATION DETECTION METHOD AND SYSTEM FOR MONITORING COPPER CONTAMINATION
- 专利标题(中): 铜污染检测方法和监测铜污染的系统
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申请号: US11863502申请日: 2007-09-28
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公开(公告)号: US20090087928A1公开(公告)日: 2009-04-02
- 发明人: Jay Sanford Burnham , Joseph Kerry Vaughn Comeau , Leslie Peter Crane , James Randall Elliott , Scott Alan Estes , James Spiros Nakos , Eric Jeffrey White
- 申请人: Jay Sanford Burnham , Joseph Kerry Vaughn Comeau , Leslie Peter Crane , James Randall Elliott , Scott Alan Estes , James Spiros Nakos , Eric Jeffrey White
- 主分类号: H01L21/66
- IPC分类号: H01L21/66
摘要:
A method of monitoring copper contamination. The method includes method, comprising: (a) ion-implanting an N-type dopant into a region of single-crystal silicon substrate, the region abutting a top surface of the substrate; (c) activating the N-type dopant by annealing the substrate at a temperature of 500° C. or higher in an inert atmosphere; (c) submerging, for a present duration of time, the substrate into an aqueous solution, the aqueous solution to be monitored for copper contamination; and (d) determining an amount of copper adsorbed from the aqueous solution by the region of the substrate.