发明申请
- 专利标题： POLISHING WHEEL
- 专利标题（中）： 抛光轮
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申请号： US11722113申请日： 2005-12-21
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公开(公告)号： US20090088055A1公开(公告)日： 2009-04-02
- 发明人: Marc Silva , James Daniel Riall , Jean-Marc Padiou , Loic Quere
- 申请人： Marc Silva , James Daniel Riall , Jean-Marc Padiou , Loic Quere
- 国际申请： PCT/EP05/14214 WO 20051221
- 主分类号： B23F21/03
- IPC分类号： B23F21/03
摘要：
A polishing wheel (10) arranged to polish an article. The polishing wheel comprises a hub (12) pro-vided with an axial cavity (18) coaxial with an axis (26). The polishing wheel further comprises a substrate layer (14) being made of an elastomer material affixed to the hub (12) and coaxial with the axis (26). The substrate layer (14) has an outer surface (20) having a substantially symmetrical shape with respect to the axis (26). The polishing wheel (10) further comprises a continuous cover layer (16) affixed to the outer surface (20) and coaxial with the axis (26). The continuous cover layer (16) is made of an elastomer material covering substantially entirely the outer surface (20).
公开/授权文献
- US08348717B2 Polishing wheel 公开/授权日：2013-01-08
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