An active matrix substrate includes: storage capacitor wirings (18); a Cs trunk wiring (50) connected with the storage capacitor wirings via contact holes (48) provided in a non-display region (44); scanning signal lines (16) provided in the same layer as the storage capacitor wirings (18) and crossing the Cs trunk wiring (50) in the non-display region (44); an insulating layer between the storage capacitor wirings (18) and the Cs trunk wiring (50) which includes: a through-bore portion for forming the contact hole (48); a first film thickness portion (53) adjacent to the through-bore portion; and a second film thickness portion which is thicker than the first film thickness portion (53) and situated at least in the intersections of the storage capacitor wirings (18) with the Cs trunk wiring (50). Consequently, the storage capacitor wirings (18) and the Cs trunk wiring (50) are connected with high precision, and a short circuit between the Cs trunk wiring (50) and the scanning signal lines (16) is unlikely to occur.